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On the thermal stability of multilayer optics for use with high X-ray intensities
ID Zakharova, Margarita (Avtor), ID Rek, Zlatko (Avtor), ID Šarler, Božidar (Avtor), ID Bajt, Saša (Avtor)

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Izvleček
High-intensity X-ray free electron laser (XFEL) beams require optics made of materials with minimal radiation absorption, high diffraction efficiency, and high radiation hardness. Multilayer Laue lenses (MLLs) are diffraction-based X-ray optics that can focus XFEL beams, as already demonstrated with tungsten carbide/silicon carbide (WC/SiC)-based MLLs. However, high atomic number materials such as tungsten strongly absorb X-rays, resulting in high heat loads. Numerical simulations predict much lower heat loads in MLLs consisting of low atomic number Z materials, although such MLLs have narrower rocking curve widths. In this paper, we first screen various multilayer candidates and then focus on Mo2C/SiC multilayer due to its high diffraction efficiency. According to numerical simulations, the maximum temperature in this multilayer should remain below 300°C if the MLL made out of this multilayer is exposed to an XFEL beam of 17.5 keV photon energy, 1 mJ energy per pulse and 10 kHz pulse repetition rate. To understand the thermal stability of the Mo2C/SiC multilayer, we performed a study on the multilayers of three different periods (1.5, 5, and 12 nm) and different Mo2C to SiC ratios. We monitored their periods, crystallinity, and stress as a function of annealing temperature for two different heating rates. The results presented in this paper indicate that Mo2C/SiC-based MLLs are viable for focusing XFEL beams without being damaged under these conditions.

Jezik:Angleški jezik
Ključne besede:x-ray optics, multilayer Laue lens, thermal stability, numerical simulation
Vrsta gradiva:Članek v reviji
Tipologija:1.01 - Izvirni znanstveni članek
Organizacija:FS - Fakulteta za strojništvo
Status publikacije:Objavljeno
Različica publikacije:Objavljena publikacija
Leto izida:2024
Št. strani:Str. 1933-1948
Številčenje:Vol. 14, iss. 8
PID:20.500.12556/RUL-159255 Povezava se odpre v novem oknu
UDK:535:519.62
ISSN pri članku:2159-3930
DOI:10.1364/OME.527226 Povezava se odpre v novem oknu
COBISS.SI-ID:200647939 Povezava se odpre v novem oknu
Datum objave v RUL:04.07.2024
Število ogledov:19
Število prenosov:1
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Gradivo je del revije

Naslov:Optical materials express
Skrajšan naslov:Opt. mater. express
Založnik:Optical Society of America
ISSN:2159-3930
COBISS.SI-ID:17733142 Povezava se odpre v novem oknu

Licence

Licenca:CC BY 4.0, Creative Commons Priznanje avtorstva 4.0 Mednarodna
Povezava:http://creativecommons.org/licenses/by/4.0/deed.sl
Opis:To je standardna licenca Creative Commons, ki daje uporabnikom največ možnosti za nadaljnjo uporabo dela, pri čemer morajo navesti avtorja.

Sekundarni jezik

Jezik:Slovenski jezik
Ključne besede:rentgenska optika, večplastna leča Laue, termična stabilnost, numerične simulacije

Projekti

Financer:Drugi - Drug financer ali več financerjev
Program financ.:Cluster of Excellence "CUI: Advanced Imaging of Matter" of the Deutsche Forschungsgemeinschaft (DFG)–EXC 2056
Številka projekta:390715994

Financer:Drugi - Drug financer ali več financerjev
Program financ.:Center for Free-Electron Laser Science (CFEL)
Naslov:Innovative methods for imaging with the use of x-ray free-electron laser (XFEL) and synchrotron sources: simulation of gas-focused micro-jets

Financer:ARIS - Javna agencija za znanstvenoraziskovalno in inovacijsko dejavnost Republike Slovenije
Številka projekta:P2-0162
Naslov:Večfazni sistemi

Financer:ARIS - Javna agencija za znanstvenoraziskovalno in inovacijsko dejavnost Republike Slovenije
Številka projekta:J2-4477
Naslov:Razvoj inovativnih brezmrežnih metod za večfizikalne in večnivojske simulacije vrhunskih tehnologij

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