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Rast 1T-TaS$_2$ kristalov z molekularno žarkovno epitaksijo
ID Resnik, David (Author), ID Mihailović, Dragan (Mentor) More about this mentor... This link opens in a new window, ID Chernolevska, Yelyzaveta (Comentor)

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Abstract
V zaključni nalogi predstavljam rast 1T-TaS$_2$ kristalov, z metodo molekularne žarkovne epitaksije. Rast poteka v ultra visokem vakuumu, kar rezultira v visoki čistosti vzorcev. 1T-TaS$_2$ je kvazi dvodimenzionalni material znan po kompleksnih faznih prehodih, povezanih z valom gostote naboja, pojavom Mottovega izolatorja in metastabilnim skritim stanjem. V nalogi predstavim elektronske lastnosti materiala, opišem napravo za molekularno žarkovno epitaksijo, razložim eksperimentalni postopek priprave in rasti kristalov ter predstavim rezultate. Eksperimentalni rezultati vsebujejo analizo vzorcev, posnetih z mikroskopom na atomsko silo, za rast kristalov na tri različne substrate: SrTiO$_3$, SiC in LSAT. Uspešna rast se je pokazala na substratu iz LSAT, kjer so zrasli nanosi debeline 50 nm, medtem ko na substratu iz SiC in SrTiO$_3$ rast ni bila potrjena, zaradi nepopolno nastavljenih rastnih parametrov.

Language:Slovenian
Keywords:1T-TaS$_2$, tantalov disulfid, rast kristalov, molekularna žarkovna epitaksija, ultra visok vakuum, val gostote naboja, tanke plasti
Work type:Final paper
Typology:2.11 - Undergraduate Thesis
Organization:FMF - Faculty of Mathematics and Physics
Year:2025
PID:20.500.12556/RUL-178197 This link opens in a new window
COBISS.SI-ID:258951939 This link opens in a new window
Publication date in RUL:21.01.2026
Views:431
Downloads:157
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Secondary language

Language:English
Title:1T-TaS$_2$ crystal growth by molecular beam epitaxy
Abstract:
This work presents the growth of 1T-TaS$_2$ crystals using molecular beam epitaxy. The growth takes place under ultra-high vacuum conditions, resulting in high purity samples. 1T-TaS$_2$ is a quasi-two-dimensional material known for its complex phase transitions related to charge density waves, Mott insulator phenomena, and metastable hidden states. The thesis covers the electronic properties of the material, describes a molecular beam epitaxy system, explains the experimental procedure for preparation and growth, and presents the results. The experimental results include sample analyses captured with an atomic force microscope for crystal growth on three different substrates: SrTiO$_3$, SiC and LSAT. Successful growth was observed on the LSAT substrate, where 50 nm layers of crystals were formed, while growth was not confirmed on SiC and SrTiO$_3$ substrates due to not perfect growing parameters.

Keywords:1T-TaS$_2$, tantalum disulfide, crystal growth, molecular beam epitaxy, ultra-high vacuum, charge density wave, thin films

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