Details

Zaposlitveni trendi kot posledica uvajanja schengenskega režima v Republiki Sloveniji : diplomsko delo
ID Petric, Brigita (Author), ID Pikalo, Jernej (Mentor) More about this mentor... This link opens in a new window

URLURL - Presentation file, Visit http://dk.fdv.uni-lj.si/dela/Petric-Brigita.PDF This link opens in a new window

Language:Slovenian
Work type:Undergraduate thesis
Typology:2.11 - Undergraduate Thesis
Organization:FDV - Faculty of Social Sciences
Place of publishing:Ljubljana
Publisher:[B. Petric]
Year:2005
Number of pages:67, [12] f.
PID:20.500.12556/RUL-7500 This link opens in a new window
UDC:341.24(043)
COBISS.SI-ID:24071773 This link opens in a new window
Publication date in RUL:11.07.2014
Views:1712
Downloads:212
Metadata:XML DC-XML DC-RDF
:
PETRIC, Brigita, 2005, Zaposlitveni trendi kot posledica uvajanja schengenskega režima v Republiki Sloveniji : diplomsko delo [online]. Bachelor’s thesis. Ljubljana : B. Petric. [Accessed 1 April 2025]. Retrieved from: http://dk.fdv.uni-lj.si/dela/Petric-Brigita.PDF
Copy citation
Share:Bookmark and Share

Similar documents

Similar works from RUL:
  1. Razvoj merilne celice za meritve električne upornosti med strjevanjem sivih litin
  2. ǂthe ǂeffects of graphite on the electrical properties of gray cast iron with lamellar graphite
  3. Postavitev metode za določanje livnosti sive litine
  4. comparison of nodularization processes at production of spheroidal cast iron
  5. comparison of mathematical models for determination the nodularity of graphite in spheroidal graphite cast irons
Similar works from other Slovenian collections:
  1. A modified test for determining the fluidity of ductile cast iron
  2. Characterisation of the effects of changes of inoculation procedure of the mechanical properties and microstructure of cast iron with spheroidal graphite
  3. Features of Niresist-D2 and commercial opportunities for Niresist spheroidal cast iron
  4. Ageing effects on electrical resistivity of Nb-doped TiO [sub] 2 thin films deposited at a high rate by reactive DC magnetron sputtering

Back