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Controllable properties of NiO nanostructures fabricated by plasma assisted-chemical vapor deposition
ID Barreca, Davide (Author), ID Scattolin, Enrico (Author), ID Maccato, Chiara (Author), ID Gasparotto, Alberto (Author), ID Signorin, Lorenzo (Author), ID El Habra, Naida (Author), ID Šuligoj, Andraž (Author), ID Lavrenčič Štangar, Urška (Author), ID Rizzi, Gian Andrea (Author)

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Abstract
An original plasma assisted vapor phase route is proposed for the low-temperature fabrication of supported NiO nanostructures on conductive glasses. The sole deposition time variation enables to tailor material properties, modulating, in turn, the system wettability and functional performances in the photodegradation of recalcitrant pollutants.

Language:English
Keywords:nickel oxide, CVD, wetting, photocatalyst, diclofenac degradation
Work type:Article
Typology:1.01 - Original Scientific Article
Organization:FKKT - Faculty of Chemistry and Chemical Technology
Publication status:Published
Publication version:Version of Record
Year:2025
Number of pages:Str. 2945-2948
Numbering:Vol. 61, iss. 14
PID:20.500.12556/RUL-170828 This link opens in a new window
UDC:546.74-31:620.3
ISSN on article:1364-548X
DOI:10.1039/D4CC06548D This link opens in a new window
COBISS.SI-ID:227386115 This link opens in a new window
Publication date in RUL:17.07.2025
Views:546
Downloads:196
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Record is a part of a journal

Title:Chemical communications
Shortened title:Chem. commun.
Publisher:Royal Society of Chemistry
ISSN:1364-548X
COBISS.SI-ID:22548229 This link opens in a new window

Licences

License:CC BY 3.0, Creative Commons Attribution 3.0 Unported
Link:https://creativecommons.org/licenses/by/3.0/deed.en
Description:You are free to reproduce and redistribute the material in any medium or format. You are free to remix, transform, and build upon the material for any purpose, even commercially. You must give appropriate credit, provide a link to the license, and indicate if changes were made. You may do so in any reasonable manner, but not in any way that suggests the licensor endorses you or your use. You may not apply legal terms or technological measures that legally restrict others from doing anything the license permits.

Secondary language

Language:Slovenian
Keywords:nikljev oksid, močenje, fotokatalizator, razgradnja diklofenaka

Projects

Funder:Other - Other funder or multiple funders
Project number:2022474YE8 (SCI-TROPHY project)

Funder:ARIS - Slovenian Research and Innovation Agency
Project number:P1-0134-2022
Name:Kemija za trajnostni razvoj

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