Numerical simulation of heat load for multilayer laue lens under exposure to XFEL pulse trains

Rek, Zlatko (author), Chapman, Henry N. (author), Šarler, Božidar (author), Bajt, Saša (author)

Multilayer Laue lenses (MLLs) made from WC and SiC were previously used to focus megahertz X-ray pulse trains of the European XFEL free-electron laser, but suffered damage with trains of 30 pulses or longer at an incident fluence of about 0.13 J/cm[sup]2 per pulse. Here, we present numerical simulations of the heating of MLLs of various designs, geometry and material properties, that are exposed to such pulse trains. We find that it should be possible to focus the full beam of about 10 J/cm[sup]2 fluence of XFEL using materials of a low atomic number. To achieve high diffraction efficiency, lenses made from such materials should be considerably thicker than those used in the experiments. In addition to the lower absorption, this leads to the deposition of energy over a larger volume of the multilayer structure and hence to a lower dose, a lower temperature increase, and an improved dissipation of heat.

• Language: English
• Keywords: X-ray free-electron lasers, X-ray optics, multilayer Laue lens, heat transfer, numerical simulation
• Work type: Article
• Typology: 1.01 - Original Scientific Article
• Organization: FS - Faculty of Mechanical Engineering
• Publication status: Published
• Publication version: Version of Record
• Publication date: 22.05.2022
• Year: 2022
• Number of pages: 18 str.
• Numbering: Vol. 9, iss. 5, art. 362
• PID: 20.500.12556/RUL-136950
• UDC: 535:536.24:519.62
• ISSN on article: 2304-6732
• DOI: 10.3390/photonics9050362
• COBISS.SI-ID: 109202947
• Publication date in RUL: 26.05.2022

Record is a part of a journal

• Title: Photonics
• Shortened title: Photonics
• Publisher: MDPI AG
• ISSN: 2304-6732
• COBISS.SI-ID: 523331609

Licences

• License: CC BY 4.0, Creative Commons Attribution 4.0 International
• Link: http://creativecommons.org/licenses/by/4.0/
• Description: This is the standard Creative Commons license that gives others maximum freedom to do what they want with the work as long as they credit the author.
• Licensing start date: 22.05.2022
• Applies to: Published

Secondary language

• Language: Slovenian
• Keywords: rentgenski laserji, rentgenska optika, večplastne leče Laue, prenos toplote, numerične simulacije