Kemijski procesi pri stereolitografiji in vloga kisika pri njih

Hočevar, Filip (author), Valentinčič, Joško (mentor), Lebar, Andrej (comentor)

V zaključni nalogi so na osnovi pregleda literature predstavljene informacije o stereolitografiji in fotopolimerizaciji. Na podlagi fotopolimerizacije s prostimi radikali in kationsko iniciirano fotopolimerizacijo je narejena primerjava med posameznimi fotopolimernimi smolami za stereolitografijo. Predstavljeni so tako načini inhibicije kisika kot tudi načini za zmanjšanje njegove inhibicije pri fotopolimerizaciji. Na podlagi dveh modelov za prikaz inhibicije kisika pri fotopolimerizaciji je narejena primerjava med vplivnimi parametri.

• Language: Slovenian
• Keywords: stereolitografija, fotopolimerizacija, fotopolimerne smole, obsevanje, kisik
• Work type: Final paper
• Typology: 2.11 - Undergraduate Thesis
• Organization: FS - Faculty of Mechanical Engineering
• Place of publishing: Ljubljana
• Publisher: [F. Hočevar]
• Year: 2019
• Number of pages: XIV, 32 f.
• PID: 20.500.12556/RUL-109779
• UDC: 542.9:678:621.9.048(043.2)
• COBISS.SI-ID: 16923419
• Publication date in RUL: 08.09.2019

Secondary language

• Language: English
• Title: Chemical processes in stereolitothography and the role of oxygen

Abstract

In this thesis, information based on a literature review about stereolithography and polymerization is presented. Based on free radical and cationic photopolymerization the comparison between different photopolymer resins for stereolithography was made. In addition to oxygen inhibition pathways, strategies to reduce oxygen inhibition was presented. Then the thesis deals with comparison between variables of two models, which demonstrated the impact of oxygen inhibition during photopolymerization.

• Keywords: stereolithography, photopolymerization, photopolymer resins, irradiation, oxygen