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Polimeri OSTE kot fotorezist za direktno lasersko litografijo
ID Tomšič, Urška (Author), ID Osterman, Natan (Mentor) More about this mentor... This link opens in a new window

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Abstract
V magistrskem delu sta predstavljena polimerni material OSTE, razvit posebej za izdelavo mikrofluidičnih vezij, ki omogoča prilagajanje mehanskih lastnosti in površinskih modifikacij po meri; ter naprava LDI za direktno lasersko litografijo, ki ponuja vso svobodo pri oblikovanju unikatnih mikrofluidičnih vezij in omogoča spreminjanje in prilagajanje dizajna med raziskovanjem. Kombinacija obeh se je uporabila v raziskovalnem delu, kjer so bili polimeri OSTE uporabljeni kot fotorezist za direktno fotolitografijo tankih nanosov (< 50 µm). Določeni so bili optimalni parametri priprave vzorcev, osvetljevanja in razvijanja. Preverjena je bila kvaliteta izdelanih struktur in zmogljivost trenutne verzije materiala ter vezava manjših površin (nekaj kvadratnih mikrometrov) na steklo, na silicijev substrat in na sam strjen material OSTE. Predstavljena je izdelava večplastnih struktur iz materiala OSTE, ki posledično omogočajo variacije mikrofluidičnih kanalov še v tretji dimenziji, tj. višina. Nadalje je bila preizkušena uporaba izdelanih večplastnih struktur kot kalup za ulivanje elastomera PDMS. Izdelano je bilo preprosto vezje z mikrofluidičnimi »3D« kanali, kjer se je opazoval pretok skozi kompleksnejše dele kanalov.

Language:Slovenian
Keywords:fotolitografija, direktno lasersko osvetljevanje, naprava LDI, fotorezist, polimeri OSTE, mikrostrukturiranje
Work type:Master's thesis/paper
Typology:2.09 - Master's Thesis
Organization:FMF - Faculty of Mathematics and Physics
Year:2018
PID:20.500.12556/RUL-105794 This link opens in a new window
COBISS.SI-ID:3276132 This link opens in a new window
Publication date in RUL:15.12.2018
Views:1206
Downloads:330
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Secondary language

Language:English
Title:OSTE polymers as photoresist for direct laser lithography
Abstract:
In this Master’s thesis is in more detail described OSTE polymer material, that was developed specially for microfluidic applications and provides specific advantages like tunable mechanical and surface properties and good bonding abilities; as well as LDI laser direct imaging device for maskless lithography, that offers freedom in designing unique microfluidic circuits and allows changing and adapting the design to specific needs during research. Combination of both is used to test the behavior of OSTE polymers in the role of photoresist for direct laser photolithography of thin layers (< 50 µm). Optimal parameters of sample preparation, illumination and development process are determined. The quality of resulting structures and capabilities of the material’s current version are examined, as well as bonding abilities of smaller areas (several square micrometers) to glass, silicon and OSTE itself. Furthermore, multilayer structures are presented, which enable variation of microfluidic channels in third dimension -- height. Same structures are then used to check materials suitability for casting and molding. A simple microfluidic device with »3D« microchannels is fabricated from PDMS, using structures made with OSTE material as a mold, and flow though complex parts of microfluidic channels is observed.

Keywords:photolithography, direct laser imaging, LDI device, photoresist, OSTE polymers, microfabrication

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