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Postopek H2O2/UV za odstranjevanje površinsko aktivnih snovi iz vode : diplomska naloga
ID Melihen, Andrej (Author), ID Drev, Darko (Mentor) More about this mentor... This link opens in a new window, ID Panjan, Jože (Comentor)

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PID: 20.500.12556/rul/fe25e159-ed24-43d6-9861-c3e5992dce90

Abstract
Na področju čiščenja odpadnih voda se, kot dopolnitev konvencionalnih pristopov, vse bolj uporabljajo, tako imenovani, napredni postopki čiščenja voda. Med njimi imajo pomembno vlogo napredni oksidacijski postopki, ki ob generiranju visoko reaktivnih hidroksilnih radikalov dosegajo razgradnjo in odstranjevanje številnih biološko nerazgradljivih vrst onesnaţevalcev. Pri tem se, ali pa tudi ne, uporablja zunanji vir UV sevanja. V tej nalogi je bil, za namen delne oz. popolne razgradnje kationske površinsko aktivne snovi ET HT, uporabljen postopek H2O2/UV-C. Obravnavana snov povzroči inhibicijo mikroorganizmov, kar pomeni, da je toksična in mora biti pred vstopom v naravno okolje ustrezno obdelana. S pomočjo matematično statističnega modeliranja RSM sem pridobil območje vrednosti neodvisnih spremenljivk (koncentracije KPK, ET HT in TOC) in njihove optimalne vrednosti, s katerimi sem lahko dobil čim boljše izide. Po izvedenih eksperimentih, katere je določil model, sem pridobljene vzorce nadalje obravnaval še v biološkem reaktorju. Cilj naloge je bil ugotoviti, ali je ET HT mogoče obdelati do te stopnje, da ne predstavlja več toksičnosti do mikroorganizmov, oz. ugotoviti, kakšen vpliv imajo različni predobdelani vzorci na mikroorganizme.

Language:Slovenian
Keywords:gradbeništvo, diplomska naloga, UNI, VKI, napredni oksidacijski postopki, H2O2/UV, površinsko aktivne snovi, inhibicija aktivnega blata, RSM
Work type:Undergraduate thesis
Typology:2.11 - Undergraduate Thesis
Organization:FGG - Faculty of Civil and Geodetic Engineering
Place of publishing:Ljubljana
Publisher:[A. Melihen]
Year:2015
Number of pages:XI, 67 str., 3 pril.
PID:20.500.12556/RUL-80029 This link opens in a new window
COBISS.SI-ID:7332449 This link opens in a new window
Publication date in RUL:05.01.2016
Views:4783
Downloads:656
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Secondary language

Language:English
Title:H2O2/UV process for surfactants removal from water
Abstract:
Besides conventional approaches to water and wastewater treatment, we know many of advanced processes that are considered as more efficient ways of treatment. Amongst them have an important role, so called, advanced oxidation processes (AOP’s) that generates highly reactive hydroksyl radicals which degrade and remove a wide specter of biologicaly nondegradable pollutants. While operating a source of UV radiation can be used or not. In present study, H2O2/UV-C treatment was applied for partial or complete degredation of cationic surfactant ET HT. Tested surfactant is displaying inhibitory effect to the microorganisms, what indicates that compound is toxic and has to be pretreated before it can enter natural environment. Using mathematical statistical RSM modeling, area of independed variables (COD, ET HT and TOC concentrations) and their optimal values performing the best out puts, was applied. After several experimental runs that were predicted by the model, corresponding samples were obtained and were furthermore tested in bioreactor. The goal of the study was to find out if ET HT surfactant can be pretreated to a level that doesn’t exhibits toxicity towards microorganisms and to find out the effects of different pretreated samples to microorganisms.

Keywords:graduation thesis, civil engineering, advanced oxidation processes, H2O2/UV, surfactants, activated sludge inhibition, RSM

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