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Reaktivno ionsko jedkanje (RIE) silicija na osnovi SF[spodaj]6/O[spodaj]2-kemije
Vrtačnik, Danilo (Author), Resnik, Drago (Author), Možek, Matej (Author), Pečar, Borut (Author), Dolžan, Tine (Author), Amon, Slavko (Author)

URLURL - Presentation file, Visit http://www.dlib.si/details/URN:NBN:SI:doc-TQNIGS13 This link opens in a new window
Language:Slovenian
Keywords:MEMS, RIE, hitrost jedkanja, profil jedkanja, selektivno jedkanje
Work type:Not categorized (r6)
Tipology:1.01 - Original Scientific Article
Organization:FE - Faculty of Electrical Engineering
Year:2012
Publisher:Društvo za vakuumsko tehniko Slovenije
Number of pages:str. 4-7
Numbering:Letn. 32, št. 2
UDC:544.558:621.794.4
ISSN on article:0351-9716
COBISS.SI-ID:9312596 Link is opened in a new window
Views:628
Downloads:216
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Record is a part of a journal

Title:Vakuumist
Shortened title:Vakuumist
Publisher:Društvo za vakuumsko tehniko Slovenije
ISSN:0351-9716
COBISS.SI-ID:16059650 This link opens in a new window

Secondary language

Language:English
Keywords:MEMS, RIE, etch rate, profile, selectivity of etching

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