20.500.12556/RUL-171608 Interakcija nevtralnih vodikovih atomov s površino kositra Interaction of Neutral Hydrogen Atoms with a Tin Surface V magistrskem delu obravnavam interakcije nevtralnih reaktivnih atomov vodika s površino kositra v radiofrekvenčno (RF) sklopljeni vodikovi plazmi ter formacijo molekule stanana (SnH$_4$). V porazelektritvenem območju, kjer sem izmeril gostoto nevtralnih vodikovih atomov v območju $n\approx 10^{21} \ \rm m^{-3}$, sem z globinsko profilno masno spektroskopijo sekundarnih ionov (SIMS) določil hitrost jedkanja kositra z vodikovimi atomi, ki znaša $w=0,8 \ \rm \frac{nm}{s}\ (1\pm12\ \%)$. Na podlagi tega sem izračunal število atomov vodika, potrebnih za odstranitev enega kositrovega atoma, ki znaša $Y^{-1}=28800 \ (1\pm8\ \%)$. Poleg tega sem analiziral nastanek kositrovih kapljic na površini silicija, ki se pojavijo zaradi lokalnega segrevanja, zaradi sproščene disociacijske energije molekule vodika. Razumevanje teh interakcij je pomembno za razvoj tekočih kovinskih divertorjev v fuzijskih reaktorjih tipa tokamak ter za napredne plazemske tehnologije, kot je ekstremna ultravijolična (EUV) litografija. This master’s thesis investigates the interactions between neutral reactive hydrogen atoms and a tin surface in a radio-frequency (RF)- coupled hydrogen plasma, focusing particularly on the formation of the stannane molecule (SnH$_4$). In the plasma's afterglow region, where the measured density of neutral hydrogen atoms is of the order of $n\approx 10^{21} \ \rm m^{-3}$, the etching rate of tin by hydrogen atoms was determined using secondary ion mass spectrometry (SIMS) depth profiling and found to be $w=0,8 \ \rm \frac{nm}{s}\ (1\pm12\ \%)$. From this, the number of hydrogen atoms required to remove a single tin atom was calculated as $Y^{-1}=28800 \ (1\pm8\ \%)$. Additionally, the formation of tin droplets on the silicon surface was analysed. These droplets result from localised heating caused by the deposition of dissociation energy from the hydrogen molecule. Understanding these interactions is relevant for the development of liquid metal divertors in tokamak fusion reactors and for advanced plasma-based technologies such as extreme ultraviolet (EUV) lithography. radiofrekvenčna nizkotlačna vodikova plazma kositer jedkanje kositra masna spektroskopija sekundarnih ionov analiza površine stanan radio-frequency low pressure hydrogen plasma tin tin etching secondary ion mass spectrometry surface analysis stannan true false false Slovenski jezik Angleški jezik Magistrsko delo/naloga 2025-08-29 08:15:11 2025-08-29 08:15:18 2025-09-08 03:52:39 0000-00-00 00:00:00 2025 0 0 0000-00-00 NiDoloceno NiDoloceno NiDoloceno 0000-00-00 0000-00-00 0000-00-00 151981 247351299 18811.pdf 18811.pdf 1 34D1394BEE8807C512533169866BB289 6ac830ee91827d8d11b4e0b71f396cd5ae11eed971a8753eb77b3dedba5335f8 699eaa8a-849f-11f0-9328-0050569b8976 https://repozitorij.uni-lj.si/Dokument.php?lang=slv&id=214988 Fakulteta za matematiko in fiziko 0 0 0