Controllable properties of NiO nanostructures fabricated by plasma assisted-chemical vapor depositionBarreca, Davide (Avtor) Scattolin, Enrico (Avtor) Maccato, Chiara (Avtor) Gasparotto, Alberto (Avtor) Signorin, Lorenzo (Avtor) El Habra, Naida (Avtor) Šuligoj, Andraž (Avtor) Lavrenčič Štangar, Urška (Avtor) Rizzi, Gian Andrea (Avtor) nickel oxideCVDwettingphotocatalystdiclofenac degradationAn original plasma assisted vapor phase route is proposed for the low-temperature fabrication of supported NiO nanostructures on conductive glasses. The sole deposition time variation enables to tailor material properties, modulating, in turn, the system wettability and functional performances in the photodegradation of recalcitrant pollutants.20252025-07-17 10:05:33Članek v reviji170828UDK: 546.74-31:620.3ISSN pri članku: 1364-548XDOI: 10.1039/D4CC06548DCOBISS_ID: 227386115sl