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<metadata xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:dc="http://purl.org/dc/elements/1.1/"><dc:title>Strategies for oxidative synthesis of N-triflyl sulfoximines</dc:title><dc:creator>Testen,	Žan	(Avtor)
	</dc:creator><dc:creator>Jereb,	Marjan	(Avtor)
	</dc:creator><dc:subject>oxidation</dc:subject><dc:subject>N-trifluoromethylthio sulfoximines</dc:subject><dc:subject>N-triflyl sulfoximines</dc:subject><dc:subject>sodium hypochlorite pentahydrate</dc:subject><dc:description>The oxidation of various structurally different N-trifluoromethylthio sulfoximines was investigated using different oxidizing agents and conditions. Mono- and disubstituted phenyl methyl and phenyl cyclopropyl N-trifluoromethylthio sulfoximines were oxidized with NaOCl·5H$_2$O in water, while sterically hindered substrates bearing bulkier alkyl chains or two phenyl rings required the addition of MeCN to the reaction mixture. Chloro-, bromo-, and cyano-substituted substrates, as well as substrates bearing the benzyl groups, required a completely different approach using m-CPBA in DCM. Each method was tested on a gram-scale, with almost no difference in yield or reaction profile. The methods were also tested on N-p-tolylthio sulfoximine where successful oxidation to the corresponding sulfone derivative was observed. Finally, the N-triflyl sulfoximines acquired in the oxidations were examined in terms of stability and reactivity in Suzuki–Miyaura and Sonogashira coupling reactions, as well as many others. The selective mono- and dinitration of 4-methoxyphenyl N-triflyl sulfoximine was demonstrated by using nitric and sulfuric acid. N-triflyl sulfoximines were found to be stable in concentrated aqueous NaOH and HCl solutions and at elevated temperatures.</dc:description><dc:date>2024</dc:date><dc:date>2024-10-03 12:52:34</dc:date><dc:type>Članek v reviji</dc:type><dc:identifier>163178</dc:identifier><dc:identifier>UDK: 547.415.3:546.22:542.943</dc:identifier><dc:identifier>ISSN pri članku: 2046-2069</dc:identifier><dc:identifier>DOI: 10.1039/D4RA04992F</dc:identifier><dc:identifier>COBISS_ID: 210006787</dc:identifier><dc:language>sl</dc:language></metadata>
