<?xml version="1.0"?>
<metadata xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xmlns:dc="http://purl.org/dc/elements/1.1/"><dc:title>Pulse-on-demand laser operation from nanosecond to femtosecond pulses and its application for high-speed processing</dc:title><dc:creator>Petelin,	Jaka	(Avtor)
	</dc:creator><dc:creator>Černe,	Luka	(Avtor)
	</dc:creator><dc:creator>Mur,	Jaka	(Avtor)
	</dc:creator><dc:creator>Agrež,	Vid	(Avtor)
	</dc:creator><dc:creator>Kočica,	Jernej Jan	(Avtor)
	</dc:creator><dc:creator>Schille,	Jörg	(Avtor)
	</dc:creator><dc:creator>Loeschner,	Udo	(Avtor)
	</dc:creator><dc:creator>Petkovšek,	Rok	(Avtor)
	</dc:creator><dc:subject>arbitrary repetition rate</dc:subject><dc:subject>fiber lasers</dc:subject><dc:subject>gain control</dc:subject><dc:subject>high speed processing</dc:subject><dc:subject>pulse-on-demand</dc:subject><dc:description>In this manuscript we present a true pulse-on-demand laser design concept using two different approaches. First, we present a fiber master oscillator power amplifier (MOPA) based quasi-continuous wave (CW) laser, working at high modulation bandwidths, for generation of nanosecond pulses. Second, we present a hybrid chirped pulse amplification (CPA)-based laser, combining a chirped-pulse fiber amplifier and an additional solid-state amplifier, for generation of femtosecond pulses. The pulse-on-demand operation is achieved without an external optical modulator/shutter at high-average powers and flexible repetition rates up to 40 MHz, using two variants of the approach for near-constant gain in the amplifier chain. The idler and marker seed sources are combined in the amplifier stages and separated at the out using either wavelength-based separation or second harmonic generation (SHG)-generation-based separation. The nanosecond laser source is further applied to high throughput processing of thin film materials. The laser is combined with a resonant scanner, using the intrinsic pulse-on-demand operation to compensate the scanner%s sinusoidal movement. We applied the setup to processing of indium tin oxide (ITO) and metallic films on flexible substrates.</dc:description><dc:date>2021</dc:date><dc:date>2022-07-11 07:53:04</dc:date><dc:type>Članek v reviji</dc:type><dc:identifier>138101</dc:identifier><dc:identifier>UDK: 621.7.015:621.375.826</dc:identifier><dc:identifier>ISSN pri članku: 2192-8576</dc:identifier><dc:identifier>DOI: 10.1515/aot-2021-0020</dc:identifier><dc:identifier>COBISS_ID: 74192131</dc:identifier><dc:language>sl</dc:language></metadata>
